Fabrication Engineering at the Micro- and Nanoscale

by Stephen A. Campbell

Publisher: Oxford University Press
ISBN: 0199861226

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Book Description

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, Fabrication Engineering at the Micro- and Nanoscale, Fourth Edition, covers the entire basic unit processes used to fabricate integrated circuits and other devices.

With many worked examples and detailed illustrations, this engaging introduction provides the tools needed to understand the frontiers of fabrication processes.

NEW TO THIS EDITION

Coverage of many new topics including:

• the flash and spike annealing processes
• extreme ultraviolet (EUV) lithography
• GaN epitaxial growth and doping
• double exposure routes to sub-35-nm lithography
• architectures for nanoscale CMOS as practiced at the 45-nm node
• trigate or FINFET CMOS planned for 22 nm and below
• bulk silicon and thin film solar cell manufacturing
• GaN LED fabrication
• microfluidics

Updated sections on nonoptical lithography

Expanded content on state-of-the-art CMOS

A Companion Website with PowerPoint slides of figures from the text (www.oup.com/us/campbell)

An Instructor's Solutions Manual, available to registered adopters of the text (978-0-19-986121-7)

Book Reviews

"This is one of the best texts in the field. It provides the most complete coverage of fabrication techniques." - Xian-An Cao, West Virginia University

"I like Campbell's style and enjoy reading the text. The material is appropriate for the intended audience and there are good summaries of background material." - Trevor Thornton, Arizona State University

About the Author

Stephen A. Campbell is the Bordeau Professor of Electrical and Computer Engineering at the University of Minnesota and a fellow of IEEE.

Customer Reviews

I am in the industry. Had this book from back in grad-school semiconductor class and lab. Good intro book, moderate reference book (good basics, but no latest and greatest and it is missing much process design aspect of things), lacks some details but usually your professor or instructor would have covered it in the labs, homeworks, classnotes, etc. MANY TYPOS in this version. Would honestly rate is as 3 but there isn't much alternative out there anyway.

I used this text in a senior-level microelectronics fabrication course and rate it highly. It is a thorough and up to date reference for nearly ALL aspects of modern fabrication technology. The fundamentals like wafer growth, diffusion, oxidation and implantation are covered in the first 5 chapters. Some of this material can be overly technical for those with little background, but I found the tables, diagrams and plots quite helpful.

The rest of the text is broken into sections on patterning (optical and nonoptical lithography, etching,) thin films (evaporation, sputtering, CVD, epitaxial growth,) and process integration (CMOS, GaAs, device technology, bipolar, MEMS.) Each of the subtopics I noted is given a chapter's worth of coverage, so plenty of detail is presented. I think it's a great technical reference and a definite keeper.

This is the text book for Mr. Campbell's microfabrication class (advanced undergraduate or graduate level) at the University of Minnesota, that's how I got to know this book. It covers all the different areas of modern microfabrication and puts them in the right context to one another. Any previous knowledge of these topics is not required.